• DocumentCode
    413831
  • Title

    High efficiency gallium doped and boron doped multicrystalline silicon solar cells

  • Author

    Fuji, S. ; Fukui, K. ; Sihirasawa, K. ; Dhamrin, M. ; Saitoh, T.

  • Author_Institution
    Kyocera Corp., Shiga, Japan
  • Volume
    2
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    1493
  • Abstract
    Recently, the mono- and the multicrystalline (mc) silicon wafer technology have dominated the photovoltaic market because of its advantage of conversion efficiency, reliability and cost in comparison with other technology. Especially the market share of mc-Si solar cell seems to be more than 50% in 2002. We have been investigating the mc-Si photovoltaic solar cells to reduce the cost for many years. The improvement of the solar cell efficiency has a drastic effect on the reduction of the solar cell cost. The improvement of mc-Si material especially boron related defects which decorate the band gap with various defects including well-known iron-boron pairs is very important issue for the higher cell efficiency. In this paper, we have investigated an approach that leads to an efficiency improvement by the substitution of boron (B) by gallium (Ga) as the dopant material.
  • Keywords
    boron; elemental semiconductors; energy conservation; energy gap; gallium; semiconductor device reliability; silicon; solar cells; Si:B; Si:Ga; band gap; boron doped multicrystalline silicon solar cells; defects; dopant material; gallium doped multicrystalline silicon solar cells; iron-boron pairs; monocrystalline silicon wafer; multicrystalline silicon wafer; multicrystalline-Si photovoltaic solar cells; photovoltaic market; reliability; solar cell conversion efficiency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1306208