DocumentCode
413831
Title
High efficiency gallium doped and boron doped multicrystalline silicon solar cells
Author
Fuji, S. ; Fukui, K. ; Sihirasawa, K. ; Dhamrin, M. ; Saitoh, T.
Author_Institution
Kyocera Corp., Shiga, Japan
Volume
2
fYear
2003
fDate
18-18 May 2003
Firstpage
1493
Abstract
Recently, the mono- and the multicrystalline (mc) silicon wafer technology have dominated the photovoltaic market because of its advantage of conversion efficiency, reliability and cost in comparison with other technology. Especially the market share of mc-Si solar cell seems to be more than 50% in 2002. We have been investigating the mc-Si photovoltaic solar cells to reduce the cost for many years. The improvement of the solar cell efficiency has a drastic effect on the reduction of the solar cell cost. The improvement of mc-Si material especially boron related defects which decorate the band gap with various defects including well-known iron-boron pairs is very important issue for the higher cell efficiency. In this paper, we have investigated an approach that leads to an efficiency improvement by the substitution of boron (B) by gallium (Ga) as the dopant material.
Keywords
boron; elemental semiconductors; energy conservation; energy gap; gallium; semiconductor device reliability; silicon; solar cells; Si:B; Si:Ga; band gap; boron doped multicrystalline silicon solar cells; defects; dopant material; gallium doped multicrystalline silicon solar cells; iron-boron pairs; monocrystalline silicon wafer; multicrystalline silicon wafer; multicrystalline-Si photovoltaic solar cells; photovoltaic market; reliability; solar cell conversion efficiency;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1306208
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