Texturization of multicrystalline silicon wafers by chemical treatment using metallic catalyst

Author

Tsujino, Kazuya ; Matsumura, Michio ; Nishimoto, Yoichiro

Author_Institution

Res. Center for Solar Energy Chem., Osaka Univ., Toyonaka, Japan

Volume

2

fYear

2003

fDate

18-18 May 2003

Firstpage

1507

Abstract

A new etching method for texturing multicrystalline Si wafers for solar cells was developed. In this method, we used platinum or silver as the catalyst, which was loaded on p-type multicrystalline Si wafers by means of the electroless plating technique. After deposition of the catalyst, the wafers were etched in HF solutions, to which in some cases chemical oxidants are added. The solar cell (4 cm/sup 2/) prepared using the textured wafers showed efficiency about 1% (absolute) higher than that of the cell made from the wafer treated by the conventional alkaline etching.

Keywords

catalysts; electroless deposition; elemental semiconductors; etching; platinum; reflectivity; silicon; silver; solar cells; surface chemistry; surface texture; Ag; HF solutions; Pt; Si; alkaline etching method; chemical oxidants; chemical treatment; electroless plating; metallic catalyst; p-type multicrystalline silicon wafers texturization; platinum catalyst; silver catalyst; solar cells;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on

Conference_Location

Osaka, Japan

Print_ISBN

4-9901816-0-3

Type

conf

Filename

1306212