Title :
Deposition of Inclined Co-Pt Film With Inclined Anisotropy
Author :
Honda, A. ; Honda, Naoki ; Ariake, Jun
Author_Institution :
Grad. Sch. of Eng., Tohoku Inst. of Technol., Sendai, Japan
Abstract :
Deposition of inclined anisotropy film for bit-patterned media was studied using oblique incidence collimated sputtering. Co-Pt20 films with a thickness of 10 nm deposited on an annealed Pt/Ru under layer exhibited an inclination angle of the anisotropy axis of around 10° from the film normal corresponding to that of crystalline orientation. The anisotropy field and the inclination angle were estimated by comparing measured hysteresis loops with simulated loops. The estimated anisotropy field of the film, μ0Hκ, was around 1.2 T which indicated an expected anisotropy energy density of 6×105 J/m3. It was indicated that oblique incidence collimated sputtering is useful to fabricate inclined anisotropy recording media with high anisotropy.
Keywords :
cobalt alloys; crystal orientation; magnetic anisotropy; magnetic annealing; magnetic hysteresis; magnetic thin films; platinum alloys; ruthenium alloys; sputter deposition; CoPt20; PtRu; anisotropy axis; annealed Pt-Ru; bit-patterned media; crystalline orientation; hysteresis loops; inclination angle; inclined CoPt film; inclined anisotropy film; inclined anisotropy recording media; oblique incidence collimated sputtering; size 10 nm; Anisotropic magnetoresistance; Magnetic hysteresis; Magnetic recording; Media; Perpendicular magnetic anisotropy; Sputtering; Co-Pt film; hysteresis loop measurement; inclined anisotropy axis; oblique incidence collimated sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2013.2239964