Title :
Multi-parameter model based advanced process control
Author :
Velichko, Sergey A.
Author_Institution :
NDM Technol., Boise, ID, USA
Abstract :
Advanced Process Control (APC) plays an important role in the modern semiconductor fab. Using non-linear multiple input multiple output (MIMO) control models we significantly improve positive process outcomes. However, non-linear models also impose greater computing requirements, creating computing bottleneck on the fab-wide scale, especially for the wafer-to-wafer control. Low latency computing grids and advanced control optimization techniques solve for the computational problems.
Keywords :
MIMO systems; chemical vapour deposition; integrated circuit manufacture; nonlinear control systems; optimisation; process control; semiconductor technology; advanced process control; chemical vapour deposition; computational problems; computing grids; control optimization; multiparameter model; nonlinear multiple input multiple output control; semiconductor fab; wafer-to-wafer control; Furnaces; Inductors; MIMO; Manufacturing processes; Process control; Qualifications; Semiconductor device modeling; Semiconductor devices; Semiconductor films; Temperature;
Conference_Titel :
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN :
0-7803-8312-5
DOI :
10.1109/ASMC.2004.1309612
