DocumentCode :
414776
Title :
Lineselective CO2 lasers with anisotropic etched silicon gratings
Author :
Schuh, Rene ; Hagen, Josiah ; Schmidt, Lorenz-Peter
Author_Institution :
Lehrstuhl fur Hochfrequenztech., Erlangen-Nurnberg Univ., Erlangen, Germany
fYear :
2003
fDate :
22-27 June 2003
Firstpage :
122
Abstract :
In this paper, compact lineselective CO2 laser system is developed. To minimise resonator losses the anisotropic etched silicon grating fabricated is mounted in Littrow configuration. If the groove width of grating is varied at constant grating periodicity, a variable reflectivity grating (VRG) for one constant Littrow angle is achieved. With such VRGs it is possible to realise intra-cavity mode selection and therewith shape the outcoupled laser beam.
Keywords :
anisotropic media; carbon compounds; diffraction gratings; elemental semiconductors; etching; gas lasers; laser beams; laser cavity resonators; laser mirrors; laser modes; optical fabrication; optical losses; silicon; CO2; Littrow configuration; Si; V-groove width; anisotropic etched silicon gratings fabrication; compact lineselective CO2 lasers; grating periodicity; intra-cavity mode selection; laser beam shaping; resonator loss minmisation; variable reflectivity grating; Anisotropic magnetoresistance; Etching; Gratings; Laser beams; Laser modes; Laser stability; Mirrors; Silicon; Slabs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
Type :
conf
DOI :
10.1109/CLEOE.2003.1312183
Filename :
1312183
Link To Document :
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