DocumentCode
414776
Title
Lineselective CO2 lasers with anisotropic etched silicon gratings
Author
Schuh, Rene ; Hagen, Josiah ; Schmidt, Lorenz-Peter
Author_Institution
Lehrstuhl fur Hochfrequenztech., Erlangen-Nurnberg Univ., Erlangen, Germany
fYear
2003
fDate
22-27 June 2003
Firstpage
122
Abstract
In this paper, compact lineselective CO2 laser system is developed. To minimise resonator losses the anisotropic etched silicon grating fabricated is mounted in Littrow configuration. If the groove width of grating is varied at constant grating periodicity, a variable reflectivity grating (VRG) for one constant Littrow angle is achieved. With such VRGs it is possible to realise intra-cavity mode selection and therewith shape the outcoupled laser beam.
Keywords
anisotropic media; carbon compounds; diffraction gratings; elemental semiconductors; etching; gas lasers; laser beams; laser cavity resonators; laser mirrors; laser modes; optical fabrication; optical losses; silicon; CO2; Littrow configuration; Si; V-groove width; anisotropic etched silicon gratings fabrication; compact lineselective CO2 lasers; grating periodicity; intra-cavity mode selection; laser beam shaping; resonator loss minmisation; variable reflectivity grating; Anisotropic magnetoresistance; Etching; Gratings; Laser beams; Laser modes; Laser stability; Mirrors; Silicon; Slabs;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN
0-7803-7734-6
Type
conf
DOI
10.1109/CLEOE.2003.1312183
Filename
1312183
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