DocumentCode :
415402
Title :
Low loss 80 channel 50 GHz flat-top arrayed waveguide grating filter
Author :
Kwak, Chan Seung ; Moon, Hyung Myung ; Lee, Hyung Jong ; Park, Mahn Yong ; Song, C. Hugh
Author_Institution :
PPI Technol. Inc., Kwangju, South Korea
fYear :
2003
fDate :
22-27 June 2003
Firstpage :
548
Abstract :
The arrayed waveguide grating (AWG) device was fabricated on a 4 inch Si substrate using the planar lightwave circuit technology that consists of the flame hydrolysis deposition method and the inductively coupled plasma etching process. The average insertion loss, spectrum at the center channel, loss uniformity, nonadjacent crosstalk and polarization dependent loss (PDL) were measured and were in good agreement with the simulated transmission spectra.
Keywords :
arrayed waveguide gratings; elemental semiconductors; infrared spectra; light polarisation; light transmission; optical communication; optical crosstalk; optical fabrication; optical losses; optical planar waveguides; optical waveguide filters; silicon; sputter etching; substrates; 4 inches; 50 GHz; AWG device fabrication; Si; Si substrate; flame hydrolysis deposition; flat-top arrayed waveguide grating filter; insertion loss; loss uniformity; nonadjacent crosstalk; planar lightwave circuit technology; plasma etching; polarization dependent loss; simulated transmission spectra; Arrayed waveguide gratings; Coupling circuits; Filters; Fires; Optical arrays; Optical coupling; Planar waveguides; Plasma applications; Plasma measurements; Propagation losses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
Type :
conf
DOI :
10.1109/CLEOE.2003.1313610
Filename :
1313610
Link To Document :
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