Low loss 80 channel 50 GHz flat-top arrayed waveguide grating filter

Author

Kwak, Chan Seung ; Moon, Hyung Myung ; Lee, Hyung Jong ; Park, Mahn Yong ; Song, C. Hugh

Author_Institution

PPI Technol. Inc., Kwangju, South Korea

fYear

2003

fDate

22-27 June 2003

Firstpage

548

Abstract

The arrayed waveguide grating (AWG) device was fabricated on a 4 inch Si substrate using the planar lightwave circuit technology that consists of the flame hydrolysis deposition method and the inductively coupled plasma etching process. The average insertion loss, spectrum at the center channel, loss uniformity, nonadjacent crosstalk and polarization dependent loss (PDL) were measured and were in good agreement with the simulated transmission spectra.

Keywords

arrayed waveguide gratings; elemental semiconductors; infrared spectra; light polarisation; light transmission; optical communication; optical crosstalk; optical fabrication; optical losses; optical planar waveguides; optical waveguide filters; silicon; sputter etching; substrates; 4 inches; 50 GHz; AWG device fabrication; Si; Si substrate; flame hydrolysis deposition; flat-top arrayed waveguide grating filter; insertion loss; loss uniformity; nonadjacent crosstalk; planar lightwave circuit technology; plasma etching; polarization dependent loss; simulated transmission spectra; Arrayed waveguide gratings; Coupling circuits; Filters; Fires; Optical arrays; Optical coupling; Planar waveguides; Plasma applications; Plasma measurements; Propagation losses;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on

Print_ISBN

0-7803-7734-6

Type

conf

DOI

10.1109/CLEOE.2003.1313610

Filename

1313610