Title :
Phase correct routing for alternating phase shift masks
Author_Institution :
IBM Microelectronics Division, Essex Junction, VT
Keywords :
Algorithm design and analysis; Apertures; Interference; Lithography; Microelectronics; Permission; Rivers; Routing; Shape; Wiring;
Conference_Titel :
Design Automation Conference, 2004. Proceedings. 41st
Conference_Location :
San Diego, CA, USA
Print_ISBN :
1-51183-828-8
