DocumentCode
416285
Title
Novel sizing algorithm for yield improvement under process variation in nanometer technology
Author
Seung Hoon Choi ; Paul, B.C. ; Roy, K.
Author_Institution
Intel Corporation, U. S. A.
fYear
2004
fDate
7-11 July 2004
Firstpage
454
Lastpage
459
Abstract
Due to process parameter variations, a large variabilily in circuit delay occurs in scaled technologies affecting the yield. In this paper, we propose a sizing algorithm to ensure the speed of a circuit under process variation with a certain degree of confidence while maintaining the area and power budget within a limit. This algorithm estimates the variation in circuit delay using statistical timing analysis considering both inter-and intra-die process variation and resizes the circuit to achieve a desired yield. Experimental results on several benchmark circuits show that one can achieve up to 19% savings in area (power) using our algorithm compared to the worst-case design.
Keywords
Algorithm design and analysis; Circuits; Delay estimation; Doping profiles; Energy consumption; Fluctuations; Silicon; Threshold voltage; Timing; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 2004. Proceedings. 41st
Conference_Location
San Diego, CA, USA
ISSN
0738-100X
Print_ISBN
1-51183-828-8
Type
conf
Filename
1322524
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