Brain-machine interfaces using thin-film silicon microelectrode arrays

Author

Kipke, Daryl R.

Author_Institution

Dept. of Biomed. Eng., Michigan Univ., Ann Arbor, MI, USA

Volume

5

fYear

2004

fDate

23-26 May 2004

Abstract

The development of next-generation neuroprosthethic systems will be propelled by improved microelectrode front-ends for providing reliable and selective neural recordings. Silicon, planar micromachined microelectrode arrays have the design space for a diverse set of neuroprosthetic applications. Recent results in which these microelectrodes have been shown to consistently and reliably record high-quality neuronal spikes over several months suggest that this technology provides an appropriate function for ongoing neuroprobe development and refinement.

Keywords

biomedical electrodes; brain; elemental semiconductors; microelectrodes; micromachining; micromechanical devices; probes; prosthetics; semiconductor thin films; Si; brain-machine interface; high-quality neuronal spike recording; microelectrode front-end; neural recordings; neuroprobe development; neuroprobe refinement; neuroprosthethic system; planar micromachined microelectrode arrays; silicon thin-film; Appropriate technology; Cerebral cortex; Dielectric substrates; Humans; Microelectrodes; Neural prosthesis; Probes; Semiconductor thin films; Silicon; Space technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Circuits and Systems, 2004. ISCAS '04. Proceedings of the 2004 International Symposium on

Print_ISBN

0-7803-8251-X

Type

conf

DOI

10.1109/ISCAS.2004.1329691

Filename

1329691