DocumentCode
420455
Title
Experimental verification of the resonance phase transistor concept
Author
Wanner, R. ; Olbrich, G. ; Jorke, H. ; Luy, J.-F. ; Heim, S. ; Kasper, E. ; Russer, P.
Author_Institution
Lehrstuhl fur Hochfrequenztech., Technische Univ. Munchen, Germany
Volume
2
fYear
2004
fDate
6-11 June 2004
Firstpage
991
Abstract
In this paper we describe the experimental verification of the resonance phase effect for the first time. A silicon heterojunction bipolar transistor (HBT) has been enhanced to a resonance phase transistor (RPT) by the concept of transit time delay, using a thickened base layer. The RPT shows a current amplification far beyond its transit frequency fT. As the purpose of this paper is to demonstrate the resonance phase effect, a thick base layer of 120 nm was incorporated, thus decreasing the resonance frequency and facilitating the measurement. In the setup analyzed, a current gain of 6.5 dB has been measured at 40 GHz. By downscaling the base width the resonance frequency is expected to be increasable by a factor of four.
Keywords
elemental semiconductors; heterojunction bipolar transistors; millimetre wave transistors; silicon; 120 nm; 40 GHz; 6.5 dB; HBT; Si; current amplification; resonance frequency; resonance phase effect; resonance phase transistor; silicon heterojunction bipolar transistor; transit frequency; transit time delay; Current measurement; Delay effects; Frequency measurement; Gain; Heterojunction bipolar transistors; Phase measurement; Resonance; Resonant frequency; Silicon; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest, 2004 IEEE MTT-S International
ISSN
0149-645X
Print_ISBN
0-7803-8331-1
Type
conf
DOI
10.1109/MWSYM.2004.1339145
Filename
1339145
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