Nanophotonics for optoelectronic system integration

This study explores the unique capabilities and advantages of nanotechnology in developing next generation integrated photonic chips. The described approach includes design, modeling and simulations of example components and devices, their nanofabrication, followed by validation via characterization and testing of the fabricated devices. The latter exploits the recently constructed near field complex amplitude imaging tool. The long-range goal is to develop a range of photonic nanostructures- including artificially birefringent and resonant devices, photonic crystals with defects to tailor spectral filters, metallodielectric composites, and nanostructures for spatial field localization to enhance optical nonlinearities- to facilitate on-chip system integration through compatible materials and fabrication processes.