• DocumentCode
    422883
  • Title

    Fast soft reverse recovery diodes and thyristors with axial lifetime profile created by indium diffusion

  • Author

    Benda, Vitczslav ; Cernik, Martin

  • Author_Institution
    Dept. of Electrotechnol., Czech Tech. Univ., Prague
  • Volume
    1
  • fYear
    2004
  • fDate
    14-16 Aug. 2004
  • Firstpage
    332
  • Abstract
    The results of a study carried out on P+PNN+ silicon power diodes diffused with indium at temperatures ranging from 850 to 950 degC are reported. The influence on of indium diffusion on parameters of power diodes with a designed breakdown voltage of about 2500 V was studied; results were compared with diode structures diffused with gold and reference samples without recombination centre diffusion. It was found that indium diffusion might he used successfully for the fabrication of fast, soft reverse recovery power diodes and thyristors
  • Keywords
    diffusion; indium; power semiconductor diodes; semiconductor device packaging; silicon; thyristors; 2500 V; 850 to 950 C; breakdown voltage; diode structures; fast soft reverse recovery diodes; formatting; indium diffusion; power diode fabrication; silicon power diodes; thyristors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Electronics and Motion Control Conference, 2004. IPEMC 2004. The 4th International
  • Conference_Location
    Xi´an
  • Print_ISBN
    7-5605-1869-9
  • Type

    conf

  • Filename
    1377837