DocumentCode :
42357
Title :
Dual Ion Effect of the Lithium Silicate Resistance Random Access Memory
Author :
Kuan-Chang Chang ; Tsung-Ming Tsai ; Ting-Chang Chang ; Kai-Huang Chen ; Rui Zhang ; Zhi-Yang Wang ; Jung-Hui Chen ; Tai-Fa Young ; Min-Chen Chen ; Tian-Jian Chu ; Syuan-Yong Huang ; Yong-En Syu ; Ding-Hua Bao ; Sze, Simon M.
Author_Institution :
Dept. of Mater. & Optoelectron. Sci., Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
Volume :
35
Issue :
5
fYear :
2014
fDate :
May-14
Firstpage :
530
Lastpage :
532
Abstract :
In this letter, dual ion effect induced reset process of lithium silicate resistance random access memory (RRAM) devices is studied and discussed. Unlike the traditional silicon oxide-based RRAM, lithium ions also participate in the resistive switching process except for the oxygen ions. Owing to the twofold chemical reaction, the high resistance states are randomly distributed in a wide range. Schottky emission can be obtained through conduction current fitting, and a reaction model is established to demonstrate the special behaviors of the two types of ions, which also clarifies the gradual change of current fitting results.
Keywords :
chemical reactions; lithium compounds; random-access storage; RRAM devices; Schottky emission; conduction current fitting; dual ion effect induced reset process; high resistance states; lithium ions; lithium silicate resistance random access memory devices; oxygen ions; reaction model; resistive switching process; twofold chemical reaction; Electrodes; Ions; Lithium; Resistance; Silicon; Switches; Tin; I-V; I-V.; RRAM; dual ion effect; lithium silicate;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2311295
Filename :
6775286
Link To Document :
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