DocumentCode
425517
Title
Adaptive modeling and H/sub /spl infin// control for photolithography manufacturing process
Author
Kang, Wei ; Mao, Ziqiang John
Author_Institution
Fac. of Appl. Math., Naval Postgraduate Sch., Monterey, CA, USA
Volume
2
fYear
2004
fDate
June 30 2004-July 2 2004
Firstpage
1392
Abstract
A run-by-run feedback controller is designed for Intel manufacturing fabs to stabilize the critical dimension in the process of photolithography, in the presence of unpredictable process drift and unknown non-Gaussian disturbances. The controller is a combination of an adaptive model with an H/sub /spl infin// feedback. The model described here is a discrete-time model based on real data from the shallow trench isolation area in one of the Intel flash manufacturing fabs.
Keywords
H/sup /spl infin// control; adaptive control; control system synthesis; discrete time systems; feedback; manufacturing processes; photolithography; stability; H/sub /spl infin// feedback controller; Intel flash manufacturing fabs; adaptive model; discrete time model; photolithography manufacturing process; run-by-run feedback controller design; shallow trench isolation area; stability; unknown nonGaussian disturbances; unpredictable process drift;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2004. Proceedings of the 2004
Conference_Location
Boston, MA, USA
ISSN
0743-1619
Print_ISBN
0-7803-8335-4
Type
conf
Filename
1386769
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