Large-Area Printed Broadband Membrane Reflectors by Laser Interference Lithography

Author

Jung-Hun Seo ; Jungho Park ; Deyin Zhao ; Hongjun Yang ; Weidong Zhou ; Byeong-Kwon Ju ; Zhenqiang Ma

Author_Institution

Dept. of Electr. & Comput. Eng., Univ. of Wisconsin-Madison, Madison, WI, USA

Volume

5

Issue

1

fYear

2013

fDate

Feb. 2013

Firstpage

2200106

Lastpage

2200106

Abstract

We report here large-area broadband photonic crystal membrane reflectors (MRs) on glass substrates based on laser interference lithography (LIL) patterning and elastic stamp membrane transfer printing techniques. High-reflectivity broadband MRs on glass were realized with measured reflectivity of 95% around 1300 nm and a bandwidth of about 100 nm. Large-area nanopattern uniformity was experimentally verified with measured reflectivity from multiple locations of the large-area MRs. The work could lead to fabrication of the large-area high-performance MR at low cost with high throughput. The reflectors can be used in many types of optoelectronic and photonic devices.

Keywords

laser materials processing; light interference; membranes; nanolithography; nanopatterning; nanophotonics; optical elements; photolithography; photonic crystals; reflectivity; silicon-on-insulator; LIL; SOI wafer; Si; elastic stamp membrane transfer printing; glass substrates; large-area broadband photonic crystal membrane reflectors; laser interference lithography; nanopattern uniformity; patterning; reflectivity; Broadband communication; Glass; Laser beams; Reflectivity; Resists; Silicon; Substrates; Broadband membrane reflectors (MRs); laser interference lithography (LIL); silicon nanomembrane; transfer printing;

fLanguage

English

Journal_Title

Photonics Journal, IEEE

Publisher

ieee

ISSN

1943-0655

Type

jour

DOI

10.1109/JPHOT.2012.2236545

Filename

6449313