DocumentCode
425736
Title
100 DPPM in nanometer technology... is it achievable?
Author
Aldrich, Greg
Author_Institution
Mentor Graphics Corp., Beaverton, OR, USA
fYear
2004
fDate
26-28 Oct. 2004
Firstpage
1417
Abstract
As process technologies move to 100nm and below, maintaining acceptable defect levels has become more difficult. This panel assembles a group of experts in the area of manufacturing and test for an open discussion on the challenges and solutions available for achieving 100 defective parts per million (DPPM) or better with nanometer design technologies.
Keywords
integrated circuit design; nanotechnology; 100 nm; defect levels; defective parts per million; nanometer design technology; process technology; Assembly; Costs; Graphics; Instruments; Job shop scheduling; Large scale integration; Logic testing; Manufacturing; Process design; System testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Conference, 2004. Proceedings. ITC 2004. International
Print_ISBN
0-7803-8580-2
Type
conf
DOI
10.1109/TEST.2004.1387425
Filename
1387425
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