Title :
Improvement of Resistive Switching Characteristic in Silicon Oxide-Based RRAM Through Hydride- Oxidation on Indium Tin Oxide Electrode by Supercritical CO2 Fluid
Author :
Kuan-Chang Chang ; Tsung-Ming Tsai ; Ting-Chang Chang ; Rui Zhang ; Kai-Huang Chen ; Jung-Hui Chen ; Min-Chen Chen ; Hui-Chun Huang ; Wei Zhang ; Chih-Yang Lin ; Yi-Ting Tseng ; Hua-Ching Lin ; Jin-Cheng Zheng ; Sze, Simon M.
Author_Institution :
Dept. of Mater. & Optoelectron. Sci., Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
Abstract :
Supercritical carbon dioxide (SCCO2) fluid technology was applied to indium-tin-oxide (ITO) electrode to improve the resistive switching characteristic of silicon oxide RRAM through hydride oxidation for the first time. We found device power consumption can be effectively reduced so that side effects can be also restricted under device operation. By applying SCCO2 fluid, more oxygen ions will be introduced into the ITO electrode and thus the participation of net oxygen ions in the RRAM redox reaction will increase. Fourier transform spectroscopy and X-ray photoelectron spectroscopy were used to confirm hydride oxidation on ITO electrode. Combined with the current fitting results, we proposed a reaction model to explain the improvement of resistive switching in RRAM by SCCO2 fluids.
Keywords :
Fourier transform spectroscopy; X-ray photoelectron spectra; indium compounds; resistive RAM; silicon compounds; tin compounds; CO2; Fourier transform spectroscopy; ITO electrode; InSnO; RRAM redox reaction; SCCO2 fluid technology; X-ray photoelectron spectroscopy; hydride oxidation; hydride-oxidation; indium tin oxide electrode; net oxygen ions; resistive switching; silicon oxide-based RRAM; supercritical carbon dioxide fluid technology; Electrodes; Films; Fluids; Indium tin oxide; Ions; Silicon; Switches; ITO; RRAM; SCCO2; SiO2;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2015.2426055