DocumentCode
432208
Title
Piezoelectric micromechanical disk resonators towards UHF band
Author
Le Yan ; Wu, Jian ; Tang, William C.
Author_Institution
Dept. of Mech. & Aerosp. Eng., California Univ., Irvine, CA, USA
Volume
2
fYear
2004
fDate
23-27 Aug. 2004
Firstpage
926
Abstract
This paper presents the design, simulation, fabrication, and test results of a new type of piezoelectrically transduced micromechanical disk resonator approaching UHF frequencies. The resonators were fabricated from silicon-on-insulator (SOI) wafers with a 4-mask low-temperature process. The highest processing temperature was 250°C, allowing post-CMOS integration compatibility. Several prototype resonators with measured diameter of 100 μm and 60 μm were tested in air, with the highest resonant peak observed at 208 MHz, which matched well with simulation results from finite-element analysis. A quality factor of 15 at 208 MHz was extracted, and is expected to be significantly higher with an optimized design and vacuum testing.
Keywords
Q-factor; crystal resonators; finite element analysis; micromechanical resonators; piezoelectric transducers; silicon-on-insulator; 100 micron; 208 MHz; 250 degC; 60 micron; MEMS; SOI wafers; UHF resonators; finite-element analysis; low-temperature fabrication process; micromechanical disk resonators; piezoelectric resonators; piezoelectrically transduced resonators; post-CMOS integration compatibility; quality factor; resonant peak; Analytical models; Fabrication; Micromechanical devices; Resonance; Resonant frequency; Silicon on insulator technology; Temperature; Testing; UHF measurements; Virtual prototyping;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 2004 IEEE
ISSN
1051-0117
Print_ISBN
0-7803-8412-1
Type
conf
DOI
10.1109/ULTSYM.2004.1417887
Filename
1417887
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