• DocumentCode
    432208
  • Title

    Piezoelectric micromechanical disk resonators towards UHF band

  • Author

    Le Yan ; Wu, Jian ; Tang, William C.

  • Author_Institution
    Dept. of Mech. & Aerosp. Eng., California Univ., Irvine, CA, USA
  • Volume
    2
  • fYear
    2004
  • fDate
    23-27 Aug. 2004
  • Firstpage
    926
  • Abstract
    This paper presents the design, simulation, fabrication, and test results of a new type of piezoelectrically transduced micromechanical disk resonator approaching UHF frequencies. The resonators were fabricated from silicon-on-insulator (SOI) wafers with a 4-mask low-temperature process. The highest processing temperature was 250°C, allowing post-CMOS integration compatibility. Several prototype resonators with measured diameter of 100 μm and 60 μm were tested in air, with the highest resonant peak observed at 208 MHz, which matched well with simulation results from finite-element analysis. A quality factor of 15 at 208 MHz was extracted, and is expected to be significantly higher with an optimized design and vacuum testing.
  • Keywords
    Q-factor; crystal resonators; finite element analysis; micromechanical resonators; piezoelectric transducers; silicon-on-insulator; 100 micron; 208 MHz; 250 degC; 60 micron; MEMS; SOI wafers; UHF resonators; finite-element analysis; low-temperature fabrication process; micromechanical disk resonators; piezoelectric resonators; piezoelectrically transduced resonators; post-CMOS integration compatibility; quality factor; resonant peak; Analytical models; Fabrication; Micromechanical devices; Resonance; Resonant frequency; Silicon on insulator technology; Temperature; Testing; UHF measurements; Virtual prototyping;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 2004 IEEE
  • ISSN
    1051-0117
  • Print_ISBN
    0-7803-8412-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2004.1417887
  • Filename
    1417887