DocumentCode :
432208
Title :
Piezoelectric micromechanical disk resonators towards UHF band
Author :
Le Yan ; Wu, Jian ; Tang, William C.
Author_Institution :
Dept. of Mech. & Aerosp. Eng., California Univ., Irvine, CA, USA
Volume :
2
fYear :
2004
fDate :
23-27 Aug. 2004
Firstpage :
926
Abstract :
This paper presents the design, simulation, fabrication, and test results of a new type of piezoelectrically transduced micromechanical disk resonator approaching UHF frequencies. The resonators were fabricated from silicon-on-insulator (SOI) wafers with a 4-mask low-temperature process. The highest processing temperature was 250°C, allowing post-CMOS integration compatibility. Several prototype resonators with measured diameter of 100 μm and 60 μm were tested in air, with the highest resonant peak observed at 208 MHz, which matched well with simulation results from finite-element analysis. A quality factor of 15 at 208 MHz was extracted, and is expected to be significantly higher with an optimized design and vacuum testing.
Keywords :
Q-factor; crystal resonators; finite element analysis; micromechanical resonators; piezoelectric transducers; silicon-on-insulator; 100 micron; 208 MHz; 250 degC; 60 micron; MEMS; SOI wafers; UHF resonators; finite-element analysis; low-temperature fabrication process; micromechanical disk resonators; piezoelectric resonators; piezoelectrically transduced resonators; post-CMOS integration compatibility; quality factor; resonant peak; Analytical models; Fabrication; Micromechanical devices; Resonance; Resonant frequency; Silicon on insulator technology; Temperature; Testing; UHF measurements; Virtual prototyping;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium, 2004 IEEE
ISSN :
1051-0117
Print_ISBN :
0-7803-8412-1
Type :
conf
DOI :
10.1109/ULTSYM.2004.1417887
Filename :
1417887
Link To Document :
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