DocumentCode :
433352
Title :
Bayesian approach to reliability projection for high k dielectric thin films
Author :
Luo, Wen ; Kuo, Way ; Kuo, Yue
Author_Institution :
Dept. of Ind. Eng., Texas A&M Univ., College Station, TX, USA
fYear :
2004
fDate :
18-21 Oct. 2004
Firstpage :
186
Lastpage :
187
Abstract :
This research develops a Bayesian approach which is suitable for reliability estimation and projection of nano devices. It combines a lifetime distribution with an empirical acceleration function and places the model parameters into a hierarchical Bayesian framework. The value of the approach lies in that it can fully utilize available information in modeling uncertainty and provide plausible predictions with limited resources at the design stage of a new device.
Keywords :
Bayes methods; Weibull distribution; dielectric thin films; integrated circuit reliability; semiconductor device reliability; Bayesian reliability projection method; Weibull parameter; empirical acceleration function; hierarchical Bayesian framework; high k dielectric thin films; lifetime distribution; nano devices; reliability estimation; uncertainty modeling; Bayesian methods; Capacitors; Dielectric substrates; Dielectric thin films; Flowcharts; High K dielectric materials; High-K gate dielectrics; Industrial engineering; Life testing; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2004 IEEE International
Print_ISBN :
0-7803-8517-9
Type :
conf
DOI :
10.1109/IRWS.2004.1422771
Filename :
1422771
Link To Document :
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