Microscopic studies to surfaces film SIO/sub 2/ with admixture of carbon

In this work are considered microscopic studies to surfaces film SiO2 with admixture of carbon. It Is Shown that when introduction of carbon significant change the relief exists in film SiO2 and porosity film SiO2 with growing of the concentrations of carbon. Observed chanize the relief and porosity film SiO2 are explairied chemical interaction of carbon, with forming the flying join in process of the evaporation.