Title :
Research of plasma CF/sub 2/CL/sub 2//O/sub 2/ through the sensor of emission spectral type
Abstract :
The research of plasma chemical etching of silicon on the equipment "Plasma-600" is carried out. The dependencies of the current of the emission-spectral type sensor against flow of oxygen are measured. The influence -on these dependencies of absorption of light, of coating the quartz reactor walls by fluorplast, of presence of silicon in. the reactor is considered. Some new effects were revealed.
Keywords :
Absorption; Chemical sensors; Current measurement; Etching; Fluid flow measurement; Inductors; Plasma applications; Plasma chemistry; Plasma measurements; Silicon;
Conference_Titel :
Electronic Instrument Engineering Proceedings, 2004. APEIE 2004. 2004 7th International Conference on Actual Problems of
Conference_Location :
Novosibirsk, Russia
Print_ISBN :
0-7803-8476-8
