Title :
Nonlinear model predictive control: From chemical industry to microelectronics
Author :
Nagy, Zoltán K. ; Allgöwer, Frank
Author_Institution :
Inst. for Syst. Theor. in Eng., Stuttgart, Germany
Abstract :
The paper presents a general overview of nonlinear model predictive control (NMPC), with emphasis on problems related to robust end-point property control of batch processes. The potential advantages of using NMPC in the microelectronics industry are demonstrated using an example process of thin film deposition.
Keywords :
batch processing (industrial); chemical industry; chemical vapour deposition; integrated circuit manufacture; nonlinear control systems; predictive control; batch processes; chemical industry; microelectronics industry; nonlinear model predictive control; robust end-point property control; thin film deposition; Chemical industry; Industrial control; Microelectronics; Optimal control; Predictive control; Predictive models; Process control; Robust control; Sampling methods; Systems engineering and theory;
Conference_Titel :
Decision and Control, 2004. CDC. 43rd IEEE Conference on
Print_ISBN :
0-7803-8682-5
DOI :
10.1109/CDC.2004.1429419
