Title :
ECR-plasma equipment application for nanotechnology
Author :
Shapoval, Sergei ; Borodin, V. ; Gorbunov, V. ; Veretennikov, A.
Author_Institution :
Inst. of Microelectron. Technol. RAS, Moscow, Russia
Abstract :
Electron cyclotron resonance plasma system generated in a radially uniform magnetic field was used to produce a large area (15-20 cm diam) uniform plasma stream at 20-30 cm from the source output. The application of the ECR plasma for sub-100 nm T-shape gate of GaAs microwave transistor and microbridges of bolometric matrix was demonstrated.
Keywords :
gallium arsenide; microwave transistors; nanotechnology; plasma radiofrequency heating; ECR-plasma equipment; GaAs microwave transistor; T-shape gate; bolometric matrix; electron cyclotron resonance plasma system; microbridges; nanotechnology; uniform magnetic field; Cyclotrons; Electrons; Gallium arsenide; Magnetic fields; Magnetic resonance; Microwave devices; Microwave transistors; Nanotechnology; Plasma applications; Plasma sources;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1435071
