DocumentCode
435797
Title
Intrinsic performance of carbon-nanotube transistors
Author
Nihey, Fumiyuki ; Hongo, Hiroo ; Ochiai, Yukinori ; Yudasaka, Masako ; Iijima, Sumio
Author_Institution
Fundamental & Res. Labs., NEC Corp., Tsukuba, Japan
Volume
1
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
619
Abstract
Intrinsic transconductance of carbon-nanotube field-effect transistors (CNTFETs) was investigated with carbon nanotubes (CNTs) grown both by laser ablation and chemical vapor deposition (CVD). The measured transconductance at a drain voltage of -1V was 8.7 μS for a CVD-grown CNT with a diameter of 1.5 nm. Very high intrinsic transconductance of 20 μS was calculated by considering the contribution of parasitic resistance. Apparent and intrinsic transconductance per unit channel width are considerably larger than those for the state-of-the-art Si-MOSFETs. We expect that the performance of CNTFETs will advance further by improving CNT quality and by optimising device structures.
Keywords
carbon nanotubes; electric admittance; field effect transistors; -1 V; 1.5 nm; carbon-nanotube field-effect transistors; chemical vapor deposition; intrinsic transconductance; laser ablation; parasitic resistance; Atomic force microscopy; Carbon nanotubes; Chemical lasers; Laser ablation; MOSFETs; Optical device fabrication; Optical materials; Semiconductor materials; Substrates; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1435082
Filename
1435082
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