DocumentCode :
435797
Title :
Intrinsic performance of carbon-nanotube transistors
Author :
Nihey, Fumiyuki ; Hongo, Hiroo ; Ochiai, Yukinori ; Yudasaka, Masako ; Iijima, Sumio
Author_Institution :
Fundamental & Res. Labs., NEC Corp., Tsukuba, Japan
Volume :
1
fYear :
2004
fDate :
18-21 Oct. 2004
Firstpage :
619
Abstract :
Intrinsic transconductance of carbon-nanotube field-effect transistors (CNTFETs) was investigated with carbon nanotubes (CNTs) grown both by laser ablation and chemical vapor deposition (CVD). The measured transconductance at a drain voltage of -1V was 8.7 μS for a CVD-grown CNT with a diameter of 1.5 nm. Very high intrinsic transconductance of 20 μS was calculated by considering the contribution of parasitic resistance. Apparent and intrinsic transconductance per unit channel width are considerably larger than those for the state-of-the-art Si-MOSFETs. We expect that the performance of CNTFETs will advance further by improving CNT quality and by optimising device structures.
Keywords :
carbon nanotubes; electric admittance; field effect transistors; -1 V; 1.5 nm; carbon-nanotube field-effect transistors; chemical vapor deposition; intrinsic transconductance; laser ablation; parasitic resistance; Atomic force microscopy; Carbon nanotubes; Chemical lasers; Laser ablation; MOSFETs; Optical device fabrication; Optical materials; Semiconductor materials; Substrates; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
Type :
conf
DOI :
10.1109/ICSICT.2004.1435082
Filename :
1435082
Link To Document :
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