• DocumentCode
    435797
  • Title

    Intrinsic performance of carbon-nanotube transistors

  • Author

    Nihey, Fumiyuki ; Hongo, Hiroo ; Ochiai, Yukinori ; Yudasaka, Masako ; Iijima, Sumio

  • Author_Institution
    Fundamental & Res. Labs., NEC Corp., Tsukuba, Japan
  • Volume
    1
  • fYear
    2004
  • fDate
    18-21 Oct. 2004
  • Firstpage
    619
  • Abstract
    Intrinsic transconductance of carbon-nanotube field-effect transistors (CNTFETs) was investigated with carbon nanotubes (CNTs) grown both by laser ablation and chemical vapor deposition (CVD). The measured transconductance at a drain voltage of -1V was 8.7 μS for a CVD-grown CNT with a diameter of 1.5 nm. Very high intrinsic transconductance of 20 μS was calculated by considering the contribution of parasitic resistance. Apparent and intrinsic transconductance per unit channel width are considerably larger than those for the state-of-the-art Si-MOSFETs. We expect that the performance of CNTFETs will advance further by improving CNT quality and by optimising device structures.
  • Keywords
    carbon nanotubes; electric admittance; field effect transistors; -1 V; 1.5 nm; carbon-nanotube field-effect transistors; chemical vapor deposition; intrinsic transconductance; laser ablation; parasitic resistance; Atomic force microscopy; Carbon nanotubes; Chemical lasers; Laser ablation; MOSFETs; Optical device fabrication; Optical materials; Semiconductor materials; Substrates; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
  • Print_ISBN
    0-7803-8511-X
  • Type

    conf

  • DOI
    10.1109/ICSICT.2004.1435082
  • Filename
    1435082