DocumentCode
435834
Title
Analysis of optimized micro-rotating-structure for MEMS
Author
Liu, Zutao ; Huang, Qing-An ; Li, Weihua
Author_Institution
Key Lab. of MEMS, Southeast Univ., Nanjing, China
Volume
3
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
1747
Abstract
The paper presents an optimized micro-rotating structure for local measurement of residual strain in a thin film. The structure is composed of two actuating beams and an indicating beam. An analytical model is derived to relate the measured displacement to the residual strain of the thin film. Finite-element modeling is also used to confirm the model.
Keywords
finite element analysis; internal stresses; micromachining; microsensors; strain measurement; strain sensors; thin films; MEMS optimized micro-rotating-structure; actuating beams; finite-element modeling; indicating beam; micromachining; residual strain measurement; stress; thin film strain; Capacitive sensors; Compressive stress; Displacement measurement; Micromachining; Micromechanical devices; Residual stresses; Strain measurement; Stress measurement; Tensile stress; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1435171
Filename
1435171
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