Title :
A content-driven model-based OPC tool
Author :
Yue, Ma ; Zheng, Shi ; Ye, Chen ; Xiaolang, Yan
Author_Institution :
Inst. of VLSI Design, Zhejiang Univ., Hangzhou, China
Abstract :
With OPC technology´s wide usage in UDSM and nanometer scale IC manufacture today, new OPC tool with higher efficiency is demanded. In this paper, the framework of a new OPC tool is reported. Its layout content-aware dissection and correction flow along with the corresponding scripting commands are described as well. The performance of tool is demonstrated by experiments.
Keywords :
integrated circuit manufacture; nanotechnology; photolithography; semiconductor device manufacture; IC manufacture; OPC tool; RET; UDSM; content-driven model; layout content-aware correction flow; layout content-aware dissection flow; nanometer scale; photolithography simulation; scripting command; Computational modeling; Costs; Etching; Lithography; Optical diffraction; Optical distortion; Optical scattering; Semiconductor device manufacture; Virtual manufacturing; Writing;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1436690
