Title :
Simulation of etched profile based on singular point splitting algorithm
Author :
Li, Yu ; Li, Ruiwei ; Wang, Jimin ; Fu, Yuxia
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
Abstract :
A singular point splitting algorithm which can simulate the two-dimensional etched profile with a singular point is put forward in this paper. Based on this algorithm, we establish a simulation model of etched profile which is close to the real etched profile to the greatest extent and we validate the simulation veracity via the result of process experiment.
Keywords :
etching; etched profile simulation; singular point splitting algorithm; Acceleration; Anisotropic magnetoresistance; Application software; Computational modeling; Computer simulation; Etching; Plasma applications; Plasma simulation; Predictive models; Response surface methodology;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1436702
