DocumentCode
437316
Title
Resist elution study for immersion lithography
Author
Sato, Mitsuru ; Yoshida, Masaaki ; Ishizuka, K. ; Tsuji, Hiromitsu ; Endo, Kotaro
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
34
Lastpage
35
Keywords
Coatings; Lithography; Mass spectroscopy; Performance analysis; Performance evaluation; Resins; Resists; Semiconductor device modeling; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245708
Filename
1459458
Link To Document