Title :
Contrast improvement by top-antireflective coatings for high numerical aperture 157nm-lithography
Author :
Chen, Hsuen-Li ; Fan, Wonder ; Wu, Chi-Lung ; Chang-Liao, Kuei-Shu
Keywords :
Apertures; Coatings; Extinction coefficients; Lithography; Optical films; Optical polarization; Optical refraction; Optical variables control; Refractive index; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245711
