• DocumentCode
    437317
  • Title

    Contrast improvement by top-antireflective coatings for high numerical aperture 157nm-lithography

  • Author

    Chen, Hsuen-Li ; Fan, Wonder ; Wu, Chi-Lung ; Chang-Liao, Kuei-Shu

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    40
  • Lastpage
    41
  • Keywords
    Apertures; Coatings; Extinction coefficients; Lithography; Optical films; Optical polarization; Optical refraction; Optical variables control; Refractive index; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245711
  • Filename
    1459461
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=437317