DocumentCode :
437318
Title :
Control of selective and blanket ruthenium film deposition chemistry in supercritical CO2 fluid chemical deposition
Author :
Kondoh, Eiichi
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
48
Lastpage :
49
Keywords :
Chemical engineering; Chemistry; Dielectric thin films; Oxidation; Semiconductor thin films; Solvents; Sputtering; Surface tension; Surface topography; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245715
Filename :
1459465
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437318
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