DocumentCode
437323
Title
Highly accurate grating reference fabricated by EB cell projection lithography
Author
Nakayama, Yoshinori
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
114
Lastpage
115
Keywords
Atomic force microscopy; Dry etching; Electron optics; Gratings; Lithography; Metrology; Optical microscopy; Scanning electron microscopy; Silicon; Size measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245750
Filename
1459500
Link To Document