DocumentCode :
437323
Title :
Highly accurate grating reference fabricated by EB cell projection lithography
Author :
Nakayama, Yoshinori
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
114
Lastpage :
115
Keywords :
Atomic force microscopy; Dry etching; Electron optics; Gratings; Lithography; Metrology; Optical microscopy; Scanning electron microscopy; Silicon; Size measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245750
Filename :
1459500
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437323
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