DocumentCode :
437328
Title :
Modeling the process of electron-beam-induced deposition by dynamic Monte Carlo simulation
Author :
Liu, Z.Q. ; Mitsuishi, K. ; Furuya, K.
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
146
Lastpage :
147
Keywords :
Electron microscopy; Materials science and technology; Microelectronics; Monte Carlo methods; Probes; Shape; Spatial resolution; Tungsten; Voltage; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245766
Filename :
1459516
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437328
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