DocumentCode :
437333
Title :
Development of fast photospeed chemically amplified resist in EUV lithography
Author :
Watanabe, Takeo ; Hada, Hideo ; Lee, Seung Yoon ; Kinoshita, Hiroo ; Hamamoto, Kazuhiro ; Komano, Hiroshi
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
194
Lastpage :
195
Keywords :
Chemical industry; Chemical technology; Laboratories; Light sources; Lithography; Materials science and technology; Mirrors; Multilevel systems; Resists; Rough surfaces;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245790
Filename :
1459540
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437333
