DocumentCode
437333
Title
Development of fast photospeed chemically amplified resist in EUV lithography
Author
Watanabe, Takeo ; Hada, Hideo ; Lee, Seung Yoon ; Kinoshita, Hiroo ; Hamamoto, Kazuhiro ; Komano, Hiroshi
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
194
Lastpage
195
Keywords
Chemical industry; Chemical technology; Laboratories; Light sources; Lithography; Materials science and technology; Mirrors; Multilevel systems; Resists; Rough surfaces;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245790
Filename
1459540
Link To Document