Title :
20 nm periodical pattern by calixarene resists: comparison of CMC[4]AOMe with MC[6]AOAc
Author :
Miyamoto, Yasuyuki ; Shirai, Yasuyuki ; Yoshizawa, Masaki ; Furuya, Kazuhito
Keywords :
Acceleration; Degradation; Educational technology; Electron beams; Indium phosphide; Nanotechnology; Resists; Space technology; Voltage; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245791
