DocumentCode
437344
Title
10-nm scale pattern formation using calix[41arene EB resist for CMOS gate etching
Author
Narihiro, Mitsuru ; Arai, Kenta ; Ishida, Makoto ; Ochiai, Yukinori ; Natsuka, Yasutaka
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
340
Lastpage
341
Keywords
Ambient intelligence; Anti-freeze; Dry etching; Ethanol; Laboratories; National electric code; Pattern formation; Research and development; Resists; Surface tension;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245635
Filename
1459617
Link To Document