DocumentCode :
438171
Title :
CPP spin-valves utilizing ultra-strong Ir coupled antiparallel pinned layers for thick reference layer stabilization
Author :
Maat, Stefan ; Carey, Matthew ; Kaline, J.A. ; Childress, J.R.
Author_Institution :
San Jose Res. Center, Hitachi Global Storage Technol., San Jose, CA, USA
fYear :
2005
fDate :
4-8 April 2005
Firstpage :
17
Lastpage :
18
Abstract :
The magneto-resistance (ΔR/R) of a current-perpendicular-to-the-plane (CPP) spin-valve sensor with an anti-parallel (AP) coupled pinned layer can be increased by increasing the thickness of its reference ferromagnetic layer (AP2) close to the spin-diffusion length of the material employed within AP2 in order to generate more bulk electron spin scattering. However ultra-strong antiferromagnetic coupling is required to maintain a high saturation field in the AP coupled structure, which is one criterion for a stable sensor. We found that Ir coupled anti-parallel (AP) pinned structures can be prepared with an extremely high coupling allowing us to increase the thickness of both the pinned layer,(AP1) and AP2 to more than 100 Å while maintaining both high saturation fields and a balanced AP-pinned structure. Annealing was done at 225°C for 4 hours and the hysteresis loops of the annealed Ta(50)/NiFe(35)/CoFe10(50)/Ir(6)/CoFe10(50)/Ru(50)/Ta(25) sample and the as-deposited sample were compared which showed that Ir coupled structures are unstable against thermal annealing. We grew metallic Ir AP coupled self-pinned CPP spin valves structure which did not require annealing and patterned them into pillars using electron beam lithography and ion milling. The magnetoresistance increased with AP2 layer thickness.
Keywords :
annealing; antiferromagnetic materials; cobalt alloys; electron beam lithography; enhanced magnetoresistance; ferromagnetic materials; ion beam effects; iridium; iron alloys; magnetic hysteresis; magnetic multilayers; magnetic thin films; milling; nickel alloys; ruthenium; spin dynamics; spin valves; tantalum; 225 degC; 4 hour; CPP spin-valve sensor; Ta-NiFe-CoFe10-Ir-CoFe10-Ru-Ta; annealing; bulk electron spin scattering; current-perpendicular-to-the-plane spin-valve sensor; electron beam lithography; hysteresis loops; ion milling; magnetoresistance; reference ferromagnetic layer; saturation field; spin-diffusion length; thick reference layer stabilization; ultra-strong Ir coupled antiparallel pinned layers; ultra-strong antiferromagnetic coupling; Annealing; Antiferromagnetic materials; Electrons; Hysteresis; Magnetic materials; Magnetic sensors; Optical coupling; Saturation magnetization; Scattering; Spin valves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
Type :
conf
DOI :
10.1109/INTMAG.2005.1463437
Filename :
1463437
Link To Document :
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