DocumentCode
438190
Title
Nanoimprint technology and applications
Author
Miyauchi, Akihiro ; Haginoya, Chiseki ; Andou, Takashi
Author_Institution
Mater. Res. Lab., Hitachi Ltd., Ibaraki, Japan
fYear
2005
fDate
4-8 April 2005
Firstpage
159
Abstract
Summary form only given. The discrete track and patterned medias are candidates for higher density storage. The principal of read/write abilities has been reported. The production methods for these medias are under investigated. Nanoimprint technology is one of the attractive methods for ultra-fine patterning. The principle of nanoimprint is press molding in nano-scale. There are several points for the industrial applications such as resolution, pattern formation area, precise control of pattern transfer, lifetime of nano-mold, alignment and so on. The resolution of 6 nm half pitch was confirmed using super-lattice nano-mold (M. D. Austin, et al., 2004), and this resolution is good enough for future IT devices. Pattern formation area is also important for device production. The pattern formation on 300 mm diameter wafer was reported (M. Ogino, et al., 2004) by thermal nanoimprint process. Nanoimprint technology is spreading to not only IT/electronic devices but also bio and energy devices. It will be important that choosing the suitable technology for media application among the common nanoimprint technology.
Keywords
nanolithography; nanopatterning; device production; discrete track medias; higher density storage; nanoimprint technology; patterned medias; press molding; thermal nanoimprint process; ultrafine patterning; Industrial control; Laboratories; Material storage; Nanoscale devices; Pattern formation; Production;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1463508
Filename
1463508
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