Perpendicular orientation of barium ferrite thin film with aluminum toplayer

Author

Shams, N.N. ; Liu, X. ; Matsumoto, M. ; Morisako, A.

Author_Institution

Shinshu Univ., Japan

fYear

2005

fDate

4-8 April 2005

Firstpage

335

Lastpage

336

Abstract

Ba-ferrite thin films are deposited on a SiO₂/Si wafer substrates by facing target sputtering followed by post deposition annealing in the range of 700°C to 900°C for 1 hour. The effect of ultra thin Al toplayer on the crystallographic and magnetic properties of the films are studied by X-ray diffraction and vibration sample magnetometer measurements, respectively. Surface morphologies and nanostructures are examined by scanning electron microscopy. The results showed that the saturation magnetization values as a function of the annealing temperature are higher for the films with Al toplayer than that of the film without Al toplayer.

Keywords

X-ray diffraction; aluminium; annealing; barium compounds; ferrites; magnetic thin films; magnetisation; magnetometers; nanostructured materials; scanning electron microscopy; sputter deposition; surface morphology; 1 hour; 700 to 900 degC; BaFe₁₂O_x-Al; SiO₂-Si; X-ray diffraction; aluminum toplayer; annealing temperature; barium ferrite thin film; facing target sputtering; nanostructures; post deposition annealing; saturation magnetization; scanning electron microscopy; surface morphologies; vibration sample magnetometer; Aluminum; Annealing; Barium; Crystallography; Ferrite films; Magnetic films; Semiconductor thin films; Sputtering; Substrates; Vibration measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1463596

Filename

1463596