Magnetoimpedance (MI) in narrow FeNi/Au multilayer film systems

Author

de Cos, D. ; Fry, N. ; Panina, L.V. ; Orue, I. ; Garcia-Arribas, A. ; Barandiaran, J.M.

Author_Institution

Dept. de Electr. y Electron., Pais Vasco Univ., Spain

fYear

2005

fDate

4-8 April 2005

Firstpage

1263

Lastpage

1264

Abstract

In this work, the magnetoimpedance (MI) effect in miniature NiFe/Au/NiFe multilayer film systems with layer thickness d of 0.5 μm and width of 20-200 μm, is investigated. The films are produced by RF sputtering. Results show that films of 50 μm exhibit even larger MI ratio (of about 150% for 200-300 MHz) than that for films of 100-200 μm wide. This improvement is believed to be caused by a better established transverse anisotropy due to shape effect. Comparing with theoretical modeling, it can be concluded that MI in narrow films (below the critical width) can display improved characteristics. However, if the width decreases beyond the critical value, the MI ratio considerably drops and much higher frequencies are needed.

Keywords

gold; iron alloys; magnetic anisotropy; magnetic multilayers; magnetic thin films; magnetoresistance; nickel alloys; sputtered coatings; 0.5 mum; 20 to 200 mum; 200 to 300 MHz; NiFe-Au-NiFe; RF sputtering; magnetoimpedance; narrow multilayer film systems; transverse anisotropy; Anisotropic magnetoresistance; Frequency; Gold; Impedance; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetic flux leakage; Magnetic multilayers; Perpendicular magnetic anisotropy;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1464061

Filename

1464061