• DocumentCode
    438361
  • Title

    Tunnel magnetoresistance in magnetic tunnel junctions with a disordered Co2(Cr1-xFex)Al full-Heusler alloy film

  • Author

    Okamura, S. ; Miyazaki, A. ; Tezuka, N. ; Sugimoto, S. ; Inomata, K.

  • Author_Institution
    Dept. of Mater. Sci., Tohoku Univ., Sendai, Japan
  • fYear
    2005
  • fDate
    4-8 April 2005
  • Firstpage
    1985
  • Lastpage
    1986
  • Abstract
    The structural properties of Co2(Cr1-xFex)Al annealed at various temperatures and prepared on heated substrates are demonstrated. The TMR properties of MTJs with the disordered Co2(Cr1-xFex)Al is also shown. Magnetoresistance measurement of the MTJs was performed by using a four-point probe technique. Film structures and oxidization at surfaces and interfaces were characterized by using X-ray diffraction (XRD) (Cu-Kα) and X-ray photoelectron spectroscopy (XPS) (Al-Kα), respectively.
  • Keywords
    X-ray diffraction; X-ray photoelectron spectra; aluminium alloys; annealing; chromium alloys; cobalt alloys; ferromagnetic materials; iron alloys; magnetic thin films; tunnelling magnetoresistance; Co2(Cr1-xFex)Al; TMR; X-ray diffraction; X-ray photoelectron spectroscopy; XPS; XRD; disordered full-Heusler alloy film; film structures; four-point probe technique; magnetic tunnel junctions; oxidization; tunnel magnetoresistance; Annealing; Chromium; Iron; Magnetic tunneling; Performance evaluation; Probes; Substrates; Temperature; Tunneling magnetoresistance; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
  • Print_ISBN
    0-7803-9009-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2005.1464431
  • Filename
    1464431
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=438361