DocumentCode
438370
Title
Molecular dynamics investigations for thin film growth morphology of Ni/Ni(111)
Author
Lee, Soon-Gun ; Lee, Kwang-Ryeol ; Chung, Yong-Chae
Author_Institution
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
fYear
2005
fDate
4-8 April 2005
Firstpage
2103
Lastpage
2104
Abstract
The deposition process of Ni atoms on Ni(111) substrate for various adatom incident energy was intensively investigated by using molecular dynamics (MD) method in order to investigate morphology and quality of thin-film in atomic level. The surface roughness of the system was calculated for 1, 3 and 5 ML deposition of Ni adatom.
Keywords
adsorbed layers; metallic thin films; molecular dynamics method; nickel; sputter deposition; surface morphology; surface roughness; Ni; adatom deposition; adatom incident energy; molecular dynamics investigations; surface roughness; thin film growth morphology; Atomic layer deposition; Ceramics; Nonhomogeneous media; Rough surfaces; Sputtering; Stress; Substrates; Surface morphology; Surface roughness; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1464490
Filename
1464490
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