Title :
Guided sampling via weak motion models and outlier sample generation for epipolar geometry estimation
Author :
Goshen, Liran ; Shimshoni, Ilan
Author_Institution :
Fac. of Ind. Eng. & Manage., Technion-Israel Inst. of Technol., Haifa, Israel
Abstract :
The problem of automatic robust estimation of the epipolar geometry in cases where the correspondences are contaminated with a high percentage of outliers is addressed. This situation often occurs when the images have undergone a significant deformation, either due to large rotation or wide baseline of the cameras. An accelerated algorithm for the identification of the false matches between the views is presented. The algorithm generates a set of weak motion models (WMMs). Each WMM roughly approximates the motion of correspondences from one image to the other. The algorithm represents the distribution of the median of the geometric distances of a correspondence to the WMMs as a mixture model of outlier correspondences and inlier correspondences. The algorithm generates an outlier correspondence sample from the data. This sample is used to estimate the outlier rate and to estimate the outlier pdf. Using these two pdfs the probability that each correspondence is an inlier is estimated. These probabilities enable to guide the sampling. In the RANSAC process this guided sampling accelerates the search process. The resulting algorithm when tested on real images achieves a speedup of between one or two orders of magnitude.
Keywords :
computational geometry; image matching; image sampling; motion estimation; probability; automatic robust estimation; epipolar geometry estimation; geometric distances; outlier sample generation; weak motion models; Acceleration; Computational geometry; Computer vision; Image sampling; Industrial engineering; Motion estimation; Robustness; Sampling methods; Solid modeling; Technology management;
Conference_Titel :
Computer Vision and Pattern Recognition, 2005. CVPR 2005. IEEE Computer Society Conference on
Print_ISBN :
0-7695-2372-2
DOI :
10.1109/CVPR.2005.171