DocumentCode :
43952
Title :
VM-Based Baseline Predictive Maintenance Scheme
Author :
Yao-Sheng Hsieh ; Fan-Tien Cheng ; Hsien-Cheng Huang ; Chung-Ren Wang ; Saint-Chi Wang ; Haw-Ching Yang
Author_Institution :
Inst. of Manuf. Inf. & Syst., Nat. Cheng Kung Univ., Tainan, Taiwan
Volume :
26
Issue :
1
fYear :
2013
fDate :
Feb. 2013
Firstpage :
132
Lastpage :
144
Abstract :
Most conventional FDC approaches are used to find the TDs required for monitoring and the TDs´ related key parameters that need to be monitored, and then apply the SPC approach to detect the faults. However, in a practical situation, an abnormal key-parameter value may not be caused solely by its own TD; it may result from the other related parameters. Therefore, accurate fault classification or diagnosis may not be achieved. Moreover, most conventional PdM methods require a library of degradation patterns from previous run-to-failure data sets. Without those massive historical failure data, the PdM methods may not function properly. In this paper, we propose a virtual-metrology- (VM) based BPM scheme that possesses the capabilities of FDC and PdM. The BPM scheme contains the TD baseline model, FDC logic, and a RUL predictive module. The TD baseline model generated by the VM technique is applied to serve as the reference for detecting the fault. By applying the BPM scheme, fault diagnosis and prognosis can be accomplished, the problem of the conventional SPC method mentioned above can be resolved, and the requirement of massive historical failure data can also be released.
Keywords :
fault diagnosis; maintenance engineering; production equipment; remaining life assessment; abnormal key-parameter value; baseline predictive maintenance scheme; fault classification; fault detection; fault diagnosis; fault prognosis; production equipment; remaining useful life predictive module; target device baseline model; virtual metrology; Control charts; Data models; Degradation; Indexes; Maintenance engineering; Monitoring; Predictive models; Automatic virtual metrology (AVM); baseline predictive maintenance (BPM) scheme; dynamic-moving-window (DMW) scheme; fault detection and classification (FDC); keep important sample (KIS) scheme; predictive maintenance (PdM);
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2012.2218837
Filename :
6304937
Link To Document :
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