DocumentCode
439912
Title
Large scale integration of MNOS devices
Author
Iyer, Ravishankar ; Yu, Kaiyuan
Volume
13
fYear
1967
fDate
1967
Firstpage
18
Lastpage
20
Abstract
Silicon dioxide is highly permeable to moisture. Impurity ions such as sodium ions can migrate through the oxide. Because of these and other inherent disadvantages of silicon dioxide, silicon nitride has been used. But it is found that silicon-silicon nitride interface has inherent charge instability. This has been overcome by using a layer of silicon dioxide between silicon and silicon nitride. A dual 25-bit 4-phase shift register has been built using MOS and MNOS devices. Pyrolytic and thermal oxides have been used on
Keywords
Bipolar transistors; Circuits; Impurities; Large scale integration; MOSFETs; Moisture; Shift registers; Silicon compounds; Substrates; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Conference_Location
IEEE
Type
conf
Filename
1474858
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