• DocumentCode
    439912
  • Title

    Large scale integration of MNOS devices

  • Author

    Iyer, Ravishankar ; Yu, Kaiyuan

  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    18
  • Lastpage
    20
  • Abstract
    Silicon dioxide is highly permeable to moisture. Impurity ions such as sodium ions can migrate through the oxide. Because of these and other inherent disadvantages of silicon dioxide, silicon nitride has been used. But it is found that silicon-silicon nitride interface has inherent charge instability. This has been overcome by using a layer of silicon dioxide between silicon and silicon nitride. A dual 25-bit 4-phase shift register has been built using MOS and MNOS devices. Pyrolytic and thermal oxides have been used on
  • Keywords
    Bipolar transistors; Circuits; Impurities; Large scale integration; MOSFETs; Moisture; Shift registers; Silicon compounds; Substrates; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Conference_Location
    IEEE
  • Type

    conf

  • Filename
    1474858