• DocumentCode
    439915
  • Title

    Conductance of MOS transistors in saturation

  • Author

    Frohman-Bentchkowsky, D. ; Grove, A.S.

  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    22
  • Lastpage
    24
  • Abstract
    The finite output conductance of MOS transistors operating in the saturation region is generally attributed to the spreading of the depletion region near the drain which results in a reduction of the channel length. Previous treatments have attempted to calculate the extent of this spreading by describing the electric field distribution using step p-n junction theory. It is shown in this work that the experimentally observed output conductance can be in gross disagreement with such calculations. This discrepancy is due to the fact that, owing to the presence of the gate electrode, the electric field in the drain depletion region is greatly increased.
  • Keywords
    Doping; Impurities; Insulation; Laboratories; Length measurement; MOSFETs; P-n junctions; Substrates; Thickness measurement; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Conference_Location
    IEEE
  • Type

    conf

  • Filename
    1474861