DocumentCode
439915
Title
Conductance of MOS transistors in saturation
Author
Frohman-Bentchkowsky, D. ; Grove, A.S.
Volume
13
fYear
1967
fDate
1967
Firstpage
22
Lastpage
24
Abstract
The finite output conductance of MOS transistors operating in the saturation region is generally attributed to the spreading of the depletion region near the drain which results in a reduction of the channel length. Previous treatments have attempted to calculate the extent of this spreading by describing the electric field distribution using step p-n junction theory. It is shown in this work that the experimentally observed output conductance can be in gross disagreement with such calculations. This discrepancy is due to the fact that, owing to the presence of the gate electrode, the electric field in the drain depletion region is greatly increased.
Keywords
Doping; Impurities; Insulation; Laboratories; Length measurement; MOSFETs; P-n junctions; Substrates; Thickness measurement; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Conference_Location
IEEE
Type
conf
Filename
1474861
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