Title :
High transmission x-ray masks for lithographic applications
Author :
Bassous, E. ; Feder, R. ; Spiller, E. ; Topalian, J.
Abstract :
The fabrication steps for x-ray masks on thin (about 2000 Å) Si3N4substrates are described. The new mask substrates have a transmission close to one for AlKαradiation; the fabrication is less critical than for Si membranes.
Keywords :
Anisotropic magnetoresistance; Biomembranes; Chemical processes; Cleaning; Etching; Fabrication; Gold; Resists; Semiconductor films; Silicon;
Conference_Titel :
Electron Devices Meeting, 1975 International
Conference_Location :
IEEE
