DocumentCode
440002
Title
A new electron beam exposure scheme of scanning type
Author
Soma, T. ; Idesawa, M. ; Goto, E.
Volume
21
fYear
1975
fDate
1975
Firstpage
20
Lastpage
23
Abstract
It is well known that the large area scanning is possible by dividing the area into unit subareas, each scanned around the precisely registered reference point. An electron beam exposure scheme of scanning type, based upon the above principle, is proposed in which the reference point is obtained by the demagnified projection of the aperture matrix mask plate.
Keywords
Apertures; Chemicals; Circuits; Coils; Electron beams; Information science; Laboratories; Lenses; Lithography; Stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1975 International
Conference_Location
IEEE
Type
conf
Filename
1478176
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