Title :
A new electron beam exposure scheme of scanning type
Author :
Soma, T. ; Idesawa, M. ; Goto, E.
Abstract :
It is well known that the large area scanning is possible by dividing the area into unit subareas, each scanned around the precisely registered reference point. An electron beam exposure scheme of scanning type, based upon the above principle, is proposed in which the reference point is obtained by the demagnified projection of the aperture matrix mask plate.
Keywords :
Apertures; Chemicals; Circuits; Coils; Electron beams; Information science; Laboratories; Lenses; Lithography; Stability;
Conference_Titel :
Electron Devices Meeting, 1975 International
Conference_Location :
IEEE
