DocumentCode :
440004
Title :
Characterization of plasma-etching for semiconductor applications
Author :
Kumar, Ravindra
Volume :
21
fYear :
1975
fDate :
1975
Firstpage :
27
Lastpage :
28
Keywords :
Chemicals; Conducting materials; Crystalline materials; Etching; Fluid flow; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1975 International
Conference_Location :
IEEE
Type :
conf
Filename :
1478178
Link To Document :
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