Title : 
GaAs1-xSbx1.06 µm avalanche photodiodes
         
        
            Author : 
Scholl, F.W. ; Nakano, K. ; Eden, R.C.
         
        
            Author_Institution : 
Rockwell International, Thousand Oaks, California
         
        
        
        
        
        
            Abstract : 
Progress toward achieving high gain, avalanche photodiodes operating at 1.06µm is described. 1.06µm photodiodes have been fabricated (3 mil × 3 mil) with average gain of >14 at a leakage current of 150 na. These devices are fabricated from GaAs1-xSbxmaterial grown by LPE on GaAs substrates. Multiple layer step graded structures are used to reduce stress in the active layers. A self-terminated depletion region design has been found to give significant improvement in gain uniformity.
         
        
            Keywords : 
Avalanche photodiodes; Dark current; Electric breakdown; Fluctuations; Gallium arsenide; Leakage current; Optical materials; Optical receivers; P-n junctions; Photonic band gap;
         
        
        
        
            Conference_Titel : 
Electron Devices Meeting, 1976 International
         
        
            Conference_Location : 
Washigton, DC, USA
         
        
        
            DOI : 
10.1109/IEDM.1976.189073