DocumentCode

440209

Title

Reliability of Ultra-thin Oxides for the Giga-bit generations

Author

Groeseneken, G. ; Degraeve, R. ; Nigam, T. ; Kaczer, B. ; Maes, H.E.

Author_Institution

IMEC, Leuven, Belgium

Volume

1

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

72

Lastpage

80

Keywords

Breakdown voltage; CMOS technology; Degradation; Dielectrics; Electric breakdown; Leakage current; Statistical analysis; Stress; Temperature dependence; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

conf

Filename

1505451